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The first-ever mask-based technology for faster, precise, and sustainable printing of 3D interconnects for the display and semiconductor packaging industry.broad

Impulse Printing · Horizon Europe grant · 2025-01-01–2026-12-31

EC contribution

€2,445,036

Total cost

€0

Beneficiaries

2
About the data

Source: CORDIS (official EU open data), Horizon Europe. Framework HORIZON · call HORIZON-EIC-2024-ACCELERATOR-02 · scheme HORIZON-EIC-ACC · topic HORIZON-EIC-2024-ACCELERATORCHALLENGES-03A. CORDIS record →

Objective

At Fonontech, our vision is to pioneer a transformative and sustainable era in semiconductor packaging industry through our proprietary cutting-edge technology, Impulse Printing. Originating from extensive research and development at the Dutch leading Applied Research Institute TNO, the Impulse Printing technology has the unprecedented scalability, accuracy, and throughput for both 2D and 3D interconnect printing for the billion-dollar semiconductor and micro-LED packaging industry. The technology can attain feature sizes ranging from <10 µm to >100 µm in 3D, with the highest throughput and lowest cost of ownership, providing major competitive edge particularly in the critical lower feature range essential for enabling product miniaturization. Impulse Printing, distinguished by minimal cost of ownership and facility footprint, is safeguarded by 14 patents. It is slated for direct sales to high-volume electronic device manufacturers or through system integrators securing the company a revenue of €533 M by 2030.

Beneficiaries (2)

OrganisationCountryRoleEC contributionSME
FONONTECH HOLDING BV NL coordinator €2,445,036 Yes
FONONTECH BV NL thirdParty €0 Yes

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